Electron traps at interfaces between Si(100) and noncrystalline Al2O3, Ta2O5, and (Ta2O5)x(Al2O3)1-x alloys

被引:35
|
作者
Johnson, RS [1 ]
Hong, JG [1 ]
Lucovsky, G [1 ]
机构
[1] N Carolina State Univ, Dept Phys, Raleigh, NC 27695 USA
来源
关键词
D O I
10.1116/1.1388606
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The physical and electrical properties of noncrystalline Al2O3, Ta2O5, and their alloys, (Ta2O5)(x)(Al2O3)(1-x) are investigated. Characterization by Auger electron spectroscopy and Fourier transformation infrared spectroscopy confirm these alloys are homogeneous with pseudobinary in character, and display increased thermal stability. Capacitance - voltage and current density-voltage data as a function of temperature demonstrate that the Ta d states of the alloys act as localized electron traps, and are at an energy approximately equal to the conduction band offset of Ta2O5 with respect to Si. (C) 2001 American Vacuum Society.
引用
收藏
页码:1606 / 1610
页数:5
相关论文
共 50 条
  • [1] X-ray photoelectron spectroscopy study of Al/Ta2O5 and Ta2O5/Al buried interfaces
    Chen, K
    Yang, GR
    Nielsen, M
    Lu, TM
    Rymaszewski, EJ
    APPLIED PHYSICS LETTERS, 1997, 70 (03) : 399 - 401
  • [2] Heteroepitaxial growth of the δ-Ta2O5 films on α-Al2O3 (0001)
    Yong Le
    Xiaochen Ma
    Di Wang
    Hongdi Xiao
    Caina Luan
    Biao Zhang
    Jin Ma
    Journal of Materials Science: Materials in Electronics, 2022, 33 : 1503 - 1510
  • [3] Heteroepitaxial growth of the δ-Ta2O5 films on α-Al2O3 (0001)
    Le, Yong
    Ma, Xiaochen
    Wang, Di
    Xiao, Hongdi
    Luan, Caina
    Zhang, Biao
    Ma, Jin
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2022, 33 (03) : 1503 - 1510
  • [4] Diffusion of oxygen in amorphous Al2O3, Ta2O5, and Nb2O5
    Nakamura, R.
    Toda, T.
    Tsukui, S.
    Tane, M.
    Ishimaru, M.
    Suzuki, T.
    Nakajima, H.
    JOURNAL OF APPLIED PHYSICS, 2014, 116 (03)
  • [5] Outstanding memory characteristics with atomic layer deposited Ta2O5/Al2O3/TiO2/Al2O3/Ta2O5 nanocomposite structures as the charge trapping layer
    Han, Ping
    Lai, Tian-Cheng
    Wang, Mei
    Zhao, Xi-Rui
    Cao, Yan-Qiang
    Wu, Di
    Li, Ai-Dong
    APPLIED SURFACE SCIENCE, 2019, 467 : 423 - 427
  • [6] Fabrication and Dielectric Properties of Multilayer Ta2O5/Al2O3 Nanostructures
    Yu. K. Ezhovskii
    A. I. Klusevich
    Inorganic Materials, 2003, 39 : 1062 - 1066
  • [8] Improvement of the dielectric properties of Ta2O5 through substitution with Al2O3
    Bell Lab, Murray Hill, United States
    Appl Phys Lett, 11 (1396-1398):
  • [9] Improvement of the dielectric properties of Ta2O5 through substitution with Al2O3
    Cava, RJ
    Peck, WF
    Krajewski, JJ
    Roberts, GL
    Barber, BP
    OBryan, HM
    Gammel, PL
    APPLIED PHYSICS LETTERS, 1997, 70 (11) : 1396 - 1398
  • [10] ELLIPSOMETRIC MEASUREMENTS OF Ta2O5 AND Al2O3 FILMS ON SILICON.
    Suzuki, Takanao
    Okada, Masaru
    Chubu kogyo Daigaku kiyo. A, 1983, 19 : 75 - 79