High quality plasma enhanced chemical vapour deposited silicon oxide gas barrier coatings on polyester films

被引:50
|
作者
Howells, D. G. [1 ]
Henry, B. M. [1 ]
Madocks, J. [2 ]
Assender, H. E. [1 ]
机构
[1] Univ Oxford, Dept Mat, Oxford OX1 3PH, England
[2] Gen Plasma Inc, Tucson, AZ 85713 USA
关键词
plasma enhanced chemical vapour deposition (PECVD); gas barrier; polyester; silicon oxide; atomic force microscopy; scanning electron microscopy; organic substrates;
D O I
10.1016/j.tsf.2007.11.017
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Silicon oxide barrier coatings fabricated by a plasma enhanced chemical vapour deposition roll-to-roll process on polyester film have demonstrated impressive properties as a barrier to water vapour permeation. This study highlights the influence of the substrate on these coatings as we find that heat stabilised poly(ethylene terephthalate) (PET), with or without an additional acrylate primer layer, and poly(ethylene naphthalate) (PEN) produce superior composites than untreated PET film in terms of gas barrier. The barrier layers on PET and filled PET substrates, for which the barrier performance is within the detectable range of our measurement, have an activation energy to water permeation that increases with the thickness of the silica. For the thickest silica this is an increase of 26 kJ mol(-1) over that from the uncoated substrate. We attribute this to the creation of highly tortuous, size-hindered pathways and the decoupling of defects as the coating is deposited in multiple passes. Using a more sensitive detection technique we measure a water vapour transmission rate value as low as 2 x 10(-4) g m(-2) day(-1) for 1 mu m thick coatings on PEN. Such a good barrier is observed for these thick coatings due to the high degree of carbon detected in the films that makes them less brittle than pure SiO2 layers. Substrate surface roughness is found to influence the morphology of the SiOx films but does not seem to adversely affect the barrier performance of the composites. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:3081 / 3088
页数:8
相关论文
共 50 条
  • [31] Characterization of Thin Films Deposited with Precursor Ferrocene by Plasma Enhanced Chemical Vapour Deposition
    姚凯伦
    郑建万
    刘祖黎
    贾丽慧
    Plasma Science and Technology, 2007, 9 (04) : 436 - 439
  • [32] Characterization of thin films deposited with precursor ferrocene by plasma enhanced chemical vapour deposition
    Yao, Kailun
    Zheng, Jianwan
    Liu, Zuli
    Jia, Lihui
    PLASMA SCIENCE & TECHNOLOGY, 2007, 9 (04) : 436 - 439
  • [33] Hard amorphous silicon carbonitride coatings produced by plasma enhanced chemical vapour deposition
    Marx, G
    Körner, KU
    Heger, P
    STEEL RESEARCH, 2001, 72 (11-12): : 518 - 521
  • [34] Preparation of silicon oxide films by ultraviolet-assisted rf plasma-enhanced chemical vapour deposition
    Hozumi, A
    Sugimoto, N
    Sekoguchi, H
    Takai, O
    JOURNAL OF MATERIALS SCIENCE LETTERS, 1997, 16 (10) : 860 - 862
  • [35] Barrier properties to surrogates of hydrogenated carbon nano-films deposited on PET by plasma-enhanced chemical vapour deposition
    Oliveira, Eder C.
    Echegoyen, Yolanda
    Nerin, Cristina
    Cruz, Sandra A.
    FOOD ADDITIVES AND CONTAMINANTS PART A-CHEMISTRY ANALYSIS CONTROL EXPOSURE & RISK ASSESSMENT, 2014, 31 (11): : 1914 - 1927
  • [36] Gas barrier properties of silicon oxide films prepared by plasma-enhanced CVD using tetramethoxysilane
    Teshima, K
    Inoue, Y
    Sugimura, H
    Takai, O
    VACUUM, 2002, 66 (3-4) : 353 - 357
  • [37] Characterization of silicon oxide gas barrier films with controlling to the ion current density (ion flux) by plasma enhanced chemical vapor deposition
    Jin, Su B.
    Kim, Youn J.
    Choi, Yoon S.
    Choi, In S.
    Han, Jeon G.
    THIN SOLID FILMS, 2010, 518 (22) : 6385 - 6389
  • [38] Silicon oxynitride gas barrier coatings on poly(ether sulfone) by plasma-enhanced chemical vapor deposition
    Shim, Juno
    Yoon, Ho Gyu
    Na, Sang-Hyun
    Kim, Insun
    Kwak, Soonjong
    SURFACE & COATINGS TECHNOLOGY, 2008, 202 (13): : 2844 - 2849
  • [39] Mechanical properties of SiOx gas barrier coatings on polyester films
    Howells, D. G.
    Henry, B. M.
    Leterrier, Y.
    Manson, J. -A. E.
    Madocks, J.
    Assender, H. E.
    SURFACE & COATINGS TECHNOLOGY, 2008, 202 (15): : 3529 - 3537
  • [40] Plasma-enhanced chemical vapour-deposited silicon nitride films; The effect of annealing on optical properties and etch rates
    Wright, Daniel N.
    Marstein, Erik S.
    Rognmo, Atle
    Holt, Arve
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2008, 92 (09) : 1091 - 1098