Low-Frequency Diffusion Noise in Resistive-Switching Memories Based on Metal-Oxide Polymer Structure

被引:16
|
作者
Rocha, Paulo R. F. [1 ,2 ]
Gomes, Henrique Leonel [1 ,2 ]
Vandamme, Lode K. J. [3 ]
Chen, Qian [1 ,2 ]
Kiazadeh, Asal [1 ,2 ]
de Leeuw, Dago M. [4 ,5 ]
Meskers, Stefan C. J.
机构
[1] Inst Telecomunicacoes, P-1049001 Lisbon, Portugal
[2] Univ Algarve, P-8005139 Faro, Portugal
[3] Eindhoven Univ Technol, Dept Elect Engn, NL-5600 MB Eindhoven, Netherlands
[4] Philips Res Labs, NL-5656 AE Eindhoven, Netherlands
[5] Univ Groningen, NL-9700 AB Groningen, Netherlands
关键词
Diffusion noise; electrical properties; low-frequency noise; nonvolatile memory; random telegraph noise; resistive switching; 1/F NOISE; 1-F NOISE; FLUCTUATIONS; NIOBIUM; FILMS;
D O I
10.1109/TED.2012.2204059
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Low-frequency noise is studied in resistive-switching memories based on metal-oxide polymer diodes. The noise spectral power follows a 1/f(gamma) behavior, with gamma = 1 in the ohmic region and with gamma = 3/2 at high bias beyond the ohmic region. The exponent gamma = 3/2 is explained as noise caused by Brownian motion or diffusion of defects which induce fluctuations in diode current. The figure of merit to classify 1/f noise in thin films has an estimated value of 10(-21) cm(2)/Omega, which is typical for metals or doped semiconductors. This value in combination with the low diode current indicates that the 1/f noise is generated in the narrow localized regions in the polymer between the contacts. The analysis unambiguously shows that the current in bistable nonvolatile memories is filamentary.
引用
收藏
页码:2483 / 2487
页数:5
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