Layer-by-layer deposition of zirconia thin films from aqueous solutions

被引：8

作者：

Arcot, Pavan K. ^{[1
]}

Luo, Jian ^{[1
]}

机构：

[1] Clemson Univ, Ctr Opt Mat Sci & Engn Technol, Sch Mat Sci & Engn, Clemson, SC 29634 USA

来源：

MATERIALS LETTERS | 2008年 / 62卷 / 01期

基金：

美国国家航空航天局; 美国国家科学基金会;

关键词：

thin films; deposition; surface; kinetics; oxide; layer-by-layer deposition;

D O I：

10.1016/j.matlet.2007.04.078

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin films of ZrO2 and Y2O3-doped ZrO2 were deposited using a novel yet simple layer-by-layer technique by means of electrostatic assembling and surface precipitation via dipping substrates alternately in cationic and anionic precursor solutions. Uniform films have been made. A constant growth rate of 5.4 +/- 0.3 nm per deposition cycle for the dehydrated nanocrystalline films was achieved. This generic technique can be adapted to make other oxide films and novel multilayers or functionally-graded coatings. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：117 / 120

页数：4

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