Three-dimensional numerical simulation for anisotropic wet chemical etching process

In this paper, we present result on the development of a simulation tool for the three-dimensional anisotropic wet chemical etching for bulk micromaching. Our developed simulator comprises step of calculation the movement of the surface. It is based upon the data structure with movement of the surface cell list which has list and list 2, respectively. The surface cell has the topography evolution information which has etch properties according to crystallographic position of surface cell and cell volume value. The topography evolution information evolves movement of the surface. The performance of our developed simulator was investigated with our three-dimensional simulation results. Several simulation results demonstrate our simulation tool which is quite efficient for the design and development of MEMS device structure. The developed simulator demonstrates the applicability of complex three-dimensional MEMS device structure. We demonstrate the simulation of the anisotropic wet chemical etching process of basic exemplary structures featuring the virtual fabrication of an MEMS structure manufactured by means of bulk micromachining.