Influence of Layer Thickness in the Mcvd Method on the Composition of Fluorosilicate Glass

被引：0
|
作者：
Kulesh, A. Yu [1 ]
Yeronian, M. A. [1 ]
机构：
[1] Cent Res Inst Electropribor, AO Concern, St Petersburg 197046, Russia
来源：
GLASS PHYSICS AND CHEMISTRY | 2021年 / 47卷 / 05期
关键词：
vapor deposition; quartz glass; fluorine; fluorine doping; blanks; refractive index; FLUORINE;
D O I：
10.1134/S1087659621050096
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The effect of the thickness of deposited porous layers of nanosized silicon dioxide particles in the MCVD method on the efficiency of their doping with fluorine is studied. Its content is determined in the workpieces by the change in the refractive index of the glass. The research results show that the fluorine content is determined by the speed of the burner movement, that is, the duration of the fluorination process of the porous layer of the SiO2 particles rather than its thickness.
引用
收藏
页码：508 / 509
页数：2
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