ICP-MS determination of trace amounts of boron in high-purity quartz

被引:0
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作者
Karunasagar, D [1 ]
Dash, K [1 ]
Chandrasekaran, K [1 ]
Arunachalam, J [1 ]
机构
[1] Natl Ctr Composit Characterizat Mat, Hyderabad 500062, Andhra Pradesh, India
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中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Boron at parts per billion levels was determined in high-purity quartz using an Inductively Coupled Plasma Mass Spectrometer (ICP-MS). The loss of boron due to volatilization during removal of the matrix was eliminated by adding mannitol. The recovery of boron was established by comparing the values obtained by external calibration with those obtained by isotope dilution. Recoveries of boron of similar to 95% were obtained when the mannitol-to-boron ratio was more than 10 (w/w). Using this method, the boron content of a number of high-purity quartz samples was determined.
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页码:216 / 219
页数:4
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