Readout durability improvement of super-resolution near-field structure disc using germanium nitride interface layers

被引：0
|
作者：
Shima, Takayuki [1 ]
Yamakawa, Yuzo [1 ]
Tominaga, Junji [1 ]
Kim, Jooho [2 ]
机构：
[1] Natl Inst Adv Ind Sci & Technol, Ctr Appl Near Field Opt Res, 1-1-1 Higashi, Tsukuba, Ibaraki 3058562, Japan
[2] Samsung Elect Co Ltd, Digital Media R&D Ctr, Suwon 442742, South Korea
来源：
OPTICAL DATA STORAGE 2007 | 2007年 / 6620卷
关键词：
super-resolution readout durability; germanium nitride; Sb-Te; ZnS-SiO2; combined marks;
D O I：
10.1117/12.738929
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Inserting germanium nitride thin films between Sb-Te (for super-resolution readout) and ZnS-SiO2 layers was effective to improve super-resolution readout durability of a super-RENS disc using a PtOx-SiO2 write-once recording layer. Waveform of 97-nm (that is below the resolution limit of the optics used) and 340-nm combined marks scarcely changed even after 50,000 times readout. CNR of 100 nm marks was stable (within 3 dB decrease) after 268,000 times readout.
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页数：6
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