Readout durability improvement of super-resolution near-field structure disc using germanium nitride interface layers

被引：0

作者：

Shima, Takayuki ^{[1
]}

Yamakawa, Yuzo ^{[1
]}

Tominaga, Junji ^{[1
]}

Kim, Jooho ^{[2
]}

机构：

[1] Natl Inst Adv Ind Sci & Technol, Ctr Appl Near Field Opt Res, 1-1-1 Higashi, Tsukuba, Ibaraki 3058562, Japan

[2] Samsung Elect Co Ltd, Digital Media R&D Ctr, Suwon 442742, South Korea

来源：

OPTICAL DATA STORAGE 2007 | 2007年 / 6620卷

关键词：

super-resolution readout durability; germanium nitride; Sb-Te; ZnS-SiO2; combined marks;

D O I：

10.1117/12.738929

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Inserting germanium nitride thin films between Sb-Te (for super-resolution readout) and ZnS-SiO2 layers was effective to improve super-resolution readout durability of a super-RENS disc using a PtOx-SiO2 write-once recording layer. Waveform of 97-nm (that is below the resolution limit of the optics used) and 340-nm combined marks scarcely changed even after 50,000 times readout. CNR of 100 nm marks was stable (within 3 dB decrease) after 268,000 times readout.

引用

页数：6

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