Using CD-SEM metrology in the manufacture of semiconductors

被引：4
|
作者：
McIntosh, J [1 ]
机构：
[1] AT&T Bell Labs, Lucent Technol, Orlando, FL 32819 USA
来源：
JOM-JOURNAL OF THE MINERALS METALS & MATERIALS SOCIETY | 1999年 / 51卷 / 03期
关键词：
Uted Site; Nondestructive Evaluation Technique; Marriott Hotel; Tomation Capability; Special Test Structure;
D O I：
10.1007/s11837-999-0027-5
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Automated scanning electron microscopy tools are employed in semiconductor manufacturing to monitor the pattern-transfer process. Both feedback and feedforward information are used to control the process. The challenge for this nondestructive evaluation technique is not the instrumentation, but rather the intelligent use of the feedback and feedforward metrology inputs so that the process produces a product within specification with a minimal deviation because of in-time process drift correction.
引用
收藏
页码：38 / 39
页数：2
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