High-NA achromatic metalenses by inverse design

被引:203
|
作者
Chung, Haejun [1 ,2 ]
Miller, Owen D. [1 ,2 ]
机构
[1] Yale Univ, Dept Appl Phys, New Haven, CT 06511 USA
[2] Yale Univ, Energy Sci Inst, New Haven, CT 06511 USA
关键词
TOPOLOGY OPTIMIZATION; OPTICAL-RESPONSE; BAND; SCATTERING; LIMITS; COMPACT;
D O I
10.1364/OE.385440
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We use inverse design to discover metalens structures that exhibit broadband, achromatic focusing across low, moderate, and high numerical apertures. We show that standard unit-cell approaches cannot achieve high-efficiency high-NA focusing, even at a single frequency, due to the incompleteness of the unit-cell basis, and we provide computational upper bounds on their maximum efficiencies. At low NA, our devices exhibit the highest theoretical efficiencies to date. At high NA-of 0.9 with translation-invariant films and of 0.99 with "freeform" structures-our designs are the first to exhibit achromatic high-NA focusing. (C) 2020 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
引用
收藏
页码:6945 / 6965
页数:21
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