Low intensity beam diagnostics with microchannel plate detectors

被引:0
|
作者
Cuttone, G [1 ]
De Martinis, C [1 ]
Finocchiaro, P [1 ]
Giove, D [1 ]
Raia, G [1 ]
Rovelli, A [1 ]
机构
[1] Ist Nazl Fis Nucl, LNS, Catania, Italy
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A non destructive low intensity ion beam profile monitor has been designed and tested. The system is based on a MCP that detects the residual gas ionization produced by the ion beam. The detector is coupled to a phosphorous screen for the readout of the vertical and horizontal density profiles. Experimental results have shown that the system is able to detect beam intensities as low as 10(8) pps with a local vacuum in the measuring box of the order of 8 x 10(-6) mbar. In the paper we report the results so far obtained in beam sensitivity and measure precision as a function of the residual pressure and in different regimes of the detector.
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页码:2038 / 2040
页数:3
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