The effect of hydrogen passivation on the photoluminescence from Si nanocrystals prepared in SiO2 by ion implantation and annealing is examined as a function of nanocrystal size (implant fluence). Passivation is shown to produce a significant increase in emission intensities as well as a redshift of spectra, both of which increase with increasing fluence. These results are shown to be consistent with a model in which larger nanocrystals are assumed to contain more nonradiative defects (i.e., the defect concentration is assumed to be proportional to the nanocrystal surface area or volume). Since this results in a smaller fraction of larger nanocrystals contributing to the initial luminescence, emission spectra are initially blueshifted relative to that that might be expected from the physical nanocrystal size distribution. The contribution from larger crystallites is then disproportionately increased by passivation resulting in the observed redshift. (C) 2001 American Institute of Physics.
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Univ Fed Rio Grande do Sul, Inst Fis, BR-91501970 Porto Alegre, RS, BrazilUniv Fed Rio Grande do Sul, Inst Fis, BR-91501970 Porto Alegre, RS, Brazil
Puglia, D.
Sombrio, G.
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Univ Fed Rio Grande do Sul, PGMICRO, BR-91501907 Porto Alegre, RS, BrazilUniv Fed Rio Grande do Sul, Inst Fis, BR-91501970 Porto Alegre, RS, Brazil
Sombrio, G.
dos Reis, R.
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Univ Fed Rio Grande do Sul, Inst Fis, BR-91501970 Porto Alegre, RS, BrazilUniv Fed Rio Grande do Sul, Inst Fis, BR-91501970 Porto Alegre, RS, Brazil
dos Reis, R.
Boudinov, H.
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Univ Fed Rio Grande do Sul, Inst Fis, BR-91501970 Porto Alegre, RS, Brazil
Univ Fed Rio Grande do Sul, PGMICRO, BR-91501907 Porto Alegre, RS, BrazilUniv Fed Rio Grande do Sul, Inst Fis, BR-91501970 Porto Alegre, RS, Brazil
Boudinov, H.
2013 28TH SYMPOSIUM ON MICROELECTRONICS TECHNOLOGY AND DEVICES (SBMICRO 2013),
2013,
机构:
Fudan Univ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R ChinaFudan Univ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R China
Li, Yanli
Liang, Peipei
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Fudan Univ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R ChinaFudan Univ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R China
Liang, Peipei
Hu, Zhigao
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E China Normal Univ, Minist Educ, Lab Polar Mat & Devices, Shanghai 200241, Peoples R ChinaFudan Univ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R China
Hu, Zhigao
Guo, Shuang
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E China Normal Univ, Minist Educ, Lab Polar Mat & Devices, Shanghai 200241, Peoples R ChinaFudan Univ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R China
Guo, Shuang
Cai, Hua
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Fudan Univ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R ChinaFudan Univ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R China
Cai, Hua
Huang, Feiling
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Fudan Univ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R ChinaFudan Univ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R China
Huang, Feiling
Sun, Jian
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Fudan Univ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R ChinaFudan Univ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R China
Sun, Jian
Xu, Ning
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Fudan Univ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R ChinaFudan Univ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R China
Xu, Ning
Wu, Jiada
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Fudan Univ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R ChinaFudan Univ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R China
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Fudan Univ, State Key Lab Adv Photon Mat & Devices, Shanghai 200433, Peoples R ChinaFudan Univ, State Key Lab Adv Photon Mat & Devices, Shanghai 200433, Peoples R China
Xie, Zhi-qiang
Chen, Dan
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机构:Fudan Univ, State Key Lab Adv Photon Mat & Devices, Shanghai 200433, Peoples R China
Chen, Dan
Li, Zheng-hao
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机构:Fudan Univ, State Key Lab Adv Photon Mat & Devices, Shanghai 200433, Peoples R China
Li, Zheng-hao
Zhao, You-yuan
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机构:Fudan Univ, State Key Lab Adv Photon Mat & Devices, Shanghai 200433, Peoples R China
Zhao, You-yuan
Lu, Ming
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机构:Fudan Univ, State Key Lab Adv Photon Mat & Devices, Shanghai 200433, Peoples R China