Influence of temperature processing on electrophysical properties and phase composition of two-layer films on the base of the titanium and aluminium or nickel

被引：0
|
作者：
Stepanenko, A. O. [1 ]
Grychanovs'ka, T. M. [1 ]
Chornous, A. M. [1 ]
机构：
[1] Sumy Natl Univ, UA-40007 Sumy, Ukraine
来源：
METALLOFIZIKA I NOVEISHIE TEKHNOLOGII | 2007年 / 29卷 / 09期
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D O I：
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中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Influence of temperature processing on resistivity, temperature coefficient of resistance and phase composition of two-layer films on the base of Ti and Al or Ti and Ni, whose total thickness did not exceed 100 nm, is investigated. As shown, the annealing at T(a) = 800 K leads to solid-phase reactions between Al and TiO (Ti/Al films) or between Ti and Ni (Ni/Ti films), whose yields are TiAl(3), and Ni(3)Ti (in the films, which were annealed at 900-1000 K, NiTi and NiTi(2) phases are observed). Correlation between the phase composition and electrophysical properties of two-layer film systems is revealed.
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页码：1221 / 1229
页数：9
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