Structural, morphological and optical characterization of nanocrystalline WO3 thin films

被引：0
|
作者：
Saeed, M. H. [1 ]
Al-Timimi, M. H. [2 ]
Hussein, O. A. A. [3 ]
机构：
[1] Al Mustansiriyah Univ, Coll Basic Educ, Sci Dept, Baghdad, Iraq
[2] Univ Diyala, Coll Sci, Phys Dept, Baqubah, Iraq
[3] Al Rafidain Univ Coll, Dept Radiol, Baghdad, Iraq
来源：
DIGEST JOURNAL OF NANOMATERIALS AND BIOSTRUCTURES | 2021年 / 16卷 / 02期
关键词：
WO3 thin films; X-ray diffraction; Energy band gap; Annealing effect; ELECTROCHROMIC PROPERTIES; TUNGSTEN-OXIDE; SPRAY;
D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
WO3 Nanocrystalline thin films were prepared by Electron Beam Evaporation on cleaned glass substrates. The effect of annealing temperature on the structural, morphological, and optical properties of WO3 thin films has been studied. The single-phase monoclinic structure of the WO3 3 films has been confirmed by x-ray diffraction analysis, all films have homogenous morphology surfaces. The transmission of prepared films was measured in the wavelength range 300-900 nm. WO3 thin films show the indirect band gap ware decreased from about (3.193 eV) before annealing to about (3.061 eV) and (2.952 eV) after annealing.
引用
收藏
页码：563 / 569
页数：7
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