Self-assembled monolayers, SAMs

被引:0
|
作者
Sung, Myung Mo [1 ]
机构
[1] Hanyang Univ, Seoul, South Korea
关键词
self-assembled monolayers; micocontact printing; atomic layer deposition;
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Self-assembled monolayers (SAMs) are thin organic films which form spontaneously on solid surfaces. They have been shown to be useful as passivating layers and also for the modification of surface properties. Potential applications include wetting, adhesion, friction, chemical sensing, ultrafine scale lithography, and protection of metals against corrosion. Among these techniques for generating patterned SAMs, microcontact printing is the most practical because it is simple and rugged. This technique has been used to produce substrates for several different applications. Atomic layer deposition (ALD) is a gas-phase thin film deposition method using self-terminating surface reactions. ALD process is very sensitive to the surface conditions of the substrates, it offers an ideal method for selective deposition of thin films on patterned SAMs.
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页码:137 / 145
页数:9
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