Carbon and silicon co-doping effect on microstructural and optoelectronic properties of ZnO: An ab initio study

被引:1
|
作者
Said, K. [1 ]
Baghdad, R. [1 ]
机构
[1] Ibn Khaldoun Univ Tiaret, Matter Sci Fac, Synth & Catalysis Lab, Tiaret, Algeria
来源
OPTIK | 2022年 / 260卷
关键词
C; Si co-doping ZnO; Band structure; Dielectric constant; Refractive index; Defects points; GENERALIZED GRADIENT APPROXIMATION; DOPED ZNO; THIN-FILMS; OPTICAL-PROPERTIES; BAND-GAP; NANOSTRUCTURES; PARAMETERS; FACILE; DEFECT;
D O I
10.1016/j.ijleo.2022.169138
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The present study is a theoretical work of the effect of carbon and silicon co-doping on the optoelectronic properties of ZnO, by generalized gradient approximation (GGA) using the Perdew Burke Ernzerhof functional correlations (PBE) exchange. The results confirmed that O atoms acts as a preferential doping site in the crystal lattice. By introducing carbon atoms, the optoelectronic properties of ZnO change and we show a better absorption of visible light compared to other dopants. The co-insertion of C and Si atoms in ZnO matrix, leads to a smaller refractive index and the absorption coefficient increases. Furthermore, C and Si co-doping changes the band gap, the dielectric function and the loss energy. We also report in this paper the achieved results in the effect of co-doping with native defects points on electronic properties of ZnO.
引用
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页数:14
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