High Speed Mask Inspection Data Prep Flow based on Pipelining

被引：0

作者：

Hung, Dan ^{[1
]}

Morales, Domingo ^{[1
]}

Canepa, Juan Pablo ^{[1
]}

Kim, Stephen ^{[1
]}

Liu, Po

Sier, Jean-Paul

LoPresti, Patrick

机构：

[1] Synopsys Inc, Mountain View, CA 94043 USA

来源：

PHOTOMASK TECHNOLOGY 2011 | 2011年 / 8166卷

关键词：

mask inspection; mask inspection data preparation; MDP; OASIS.MASK; pipeline flow; I/O bottlenecks;

D O I：

10.1117/12.896964

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Mask manufacturers are continuously challenged as a result of the explosive growth in mask pattern data volume. This paper presents a new pipelined approach to mask data preparation for inspection that significantly reduces the data preparation times compared to the conventional flows used today. The focus of this approach minimizes I/O bottlenecks and allows for higher throughput on computer clusters. This solution is optimized for the industry standard OASIS.MASK format. These enhancements in the data processing flow, along with optimizations in the data preparation system architecture, offer a more efficient and highly scalable solution for mask inspection data preparation.

引用

页数：8

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