Tunnel Magnetoresistance of Ferromagnetic Antiperovskite MnGaN/MgO/CoFeB Perpendicular Magnetic Tunnel Junctions
被引:4
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作者:
Lee, Hwachol
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Natl Inst Mat Sci, Tsukuba, Ibaraki 3050047, JapanNatl Inst Mat Sci, Tsukuba, Ibaraki 3050047, Japan
Lee, Hwachol
[1
]
Sukegawa, Hiroaki
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Natl Inst Mat Sci, Tsukuba, Ibaraki 3050047, JapanNatl Inst Mat Sci, Tsukuba, Ibaraki 3050047, Japan
Sukegawa, Hiroaki
[1
]
Liu, Jun
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机构:
Natl Inst Mat Sci, Tsukuba, Ibaraki 3050047, Japan
Univ Tsukuba, Grad Sch Pure & Appl Sci, Tsukuba, Ibaraki 3058577, JapanNatl Inst Mat Sci, Tsukuba, Ibaraki 3050047, Japan
Liu, Jun
[1
,2
]
Wen, Zhenchao
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Natl Inst Mat Sci, Tsukuba, Ibaraki 3050047, JapanNatl Inst Mat Sci, Tsukuba, Ibaraki 3050047, Japan
Wen, Zhenchao
[1
]
Mitani, Seiji
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Natl Inst Mat Sci, Tsukuba, Ibaraki 3050047, Japan
Univ Tsukuba, Grad Sch Pure & Appl Sci, Tsukuba, Ibaraki 3058577, JapanNatl Inst Mat Sci, Tsukuba, Ibaraki 3050047, Japan
Mitani, Seiji
[1
,2
]
Hono, Kazuhiro
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机构:
Natl Inst Mat Sci, Tsukuba, Ibaraki 3050047, Japan
Univ Tsukuba, Grad Sch Pure & Appl Sci, Tsukuba, Ibaraki 3058577, JapanNatl Inst Mat Sci, Tsukuba, Ibaraki 3050047, Japan
Hono, Kazuhiro
[1
,2
]
机构:
[1] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050047, Japan
[2] Univ Tsukuba, Grad Sch Pure & Appl Sci, Tsukuba, Ibaraki 3058577, Japan
Antiperovskite;
MnGaN;
perpendicular magnetic anisotropy (PMA);
tunnel magnetoresistance (TMR);
ROOM-TEMPERATURE;
D O I:
10.1109/TMAG.2016.2519283
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
We report on the tunnel magnetoresistance (TMR) effect of perpendicular magnetic tunnel junctions (p-MTJs) composed of a ferromagnetic antiperovskite MnGaN film with perpendicular magnetic anisotropy. The p-MTJ multilayer stack with MnGaN/Mg/MgO/Fe/CoFeB was used to control the MgO interface conditions by the Mg and Fe insertion layers. The Mg insertion under the MgO barrier enhanced the perpendicular anisotropy of the top Fe/CoFeB layers with post-annealing process, and thus nearly perfect perpendicular magnetization was realized. A perpendicular TMR ratio up to 3.7%similar to 3.8% was obtained at room temperature. The obtained low TMR ratio is mainly attributed to the imperfect MgO barrier, which includes many lattice-misfit dislocations at the MnGaN/MgO interface due to the large lattice mismatch of 8%. This paper suggests that improving the interface state and reducing the lattice mismatch will be required to observe a higher perpendicular TMR ratio using an MnGaN electrode.
机构:
Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USANorthwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
Schreiber, D. K.
Choi, Y-S
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机构:
Canon ANELVA Corp, Elect Devices Div, Tokyo, JapanNorthwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
Choi, Y-S
Liu, Yuzi
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机构:
Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USANorthwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
Liu, Yuzi
Chiaramonti, Ann N.
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机构:
Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USANorthwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
Chiaramonti, Ann N.
Seidman, David N.
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机构:
Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
NUCAPT, Evanston, IL 60208 USANorthwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
Seidman, David N.
Petford-Long, A. K.
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机构:
Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA
Argonne Natl Lab, Ctr Nanoscale Mat, Argonne, IL 60439 USANorthwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA