Modeling of field emission microtriodes with Si semiconductor emitters

被引:1
|
作者
Nicolaescu, D [1 ]
Filip, V
Itoh, J
Okuyama, F
机构
[1] Electrotech Lab, Tsukuba, Ibaraki 3058568, Japan
[2] Nagoya Inst Technol, Dept Environm Technol, Nagoya, Aichi 466, Japan
[3] Inst Microtechnol, Bucharest 72225, Romania
来源
关键词
D O I
10.1116/1.590590
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Field emission arrays using Si semiconductor emitters have been developed using different technologies and configurations, including the field emission microtriode (FEMT). Previously reported modeling results for FEMT structures considered metallic tips and, accordingly, used the Fowler-Nordheim (FN) current density-electric field J(E) relationship. In this article, modified J(Si)(E) equations for Si semiconductor emitters are used. The FEMT model takes;into account a volcano-shaped gate with an: emitter protruding through the gate opening. The electric field distribution in the device is numerically computed solving the two-dimensional Laplace equation for the electrical potential using a lattice with a varying grid size. The field emission current is obtained through integration of J(Si)(E) over the emitter surface. No field enhancement and area factors are used. The FEMT field emission: current is computed as function of the device parameters, and is compared to "standard":results derived using the FN J(E) relationship. Similar modeling trends are obtained for; the cases of FEMTs with metal and Si emitters. (C) 1999 American Vacuum Society. [S0734-211X(99)04202-X].
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页码:542 / 546
页数:5
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