Quasi one-dimensional confinement in double-well sidewall gated resonant tunneling transistors

被引:0
|
作者
Kolagunta, VR [1 ]
Janes, DB
Melloch, MR
Youtsey, C
机构
[1] Purdue Univ, Sch Elect & Comp Engn, W Lafayette, IN 47907 USA
[2] Univ Illinois, Dept Elect Engn, Urbana, IL 61801 USA
来源
关键词
D O I
10.1109/ISCS.1998.711748
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper we present gating effects in double well resonant tunneling heterostructures with sub-micron minimum feature widths. Resonant tunneling through one dimensional states in the wells is observed as the device approaches pinch-off at temperatures as high as 77K. This is the first clear demonstration of resonant tunneling through such laterally confined one-dimensional sub-bands at 77K.
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页码:597 / 600
页数:4
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