Si donors in GaN, AlN and their alloys:: A comparison of electron spin resonance experiments and k • p model calculations

被引:0
|
作者
Bayerl, MW [1 ]
Brandt, MS [1 ]
Zeisel, R [1 ]
Ambacher, O [1 ]
Majewski, JA [1 ]
Stutzmann, M [1 ]
机构
[1] Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Silicon doped wurtzite Al(x)Ga(1)-(x)N alloys with x = 0, 0.15, 0.32, 0.52, 0.75, and 1 were characterized with electron spin resonance experiments. For Al contents x < 0.4 the g-values measured for the shallow Si donor are identical to literature values obtained from nominally undoped material. For x > 0.4 g-values are reported for the first time. The experimental results can be fitted within a five-band k (.) p model in the cubic approximation if a spin orbit splitting of the higher conduction bands of at least 50 meV is considered.
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页码:1383 / 1384
页数:2
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