Exact solution of a generalized model for surface deposition

被引:5
|
作者
Filipe, JAN [1 ]
Rodgers, GJ
机构
[1] Univ Cambridge, Dept Plant Sci, Cambridge CB2 3EA, England
[2] Univ Edinburgh, Biomath & Stat Scotland, Edinburgh EH9 3JZ, Midlothian, Scotland
[3] Brunel Univ, Dept Math Sci, Uxbridge UB8 3PH, Middx, England
来源
PHYSICAL REVIEW E | 2003年 / 68卷 / 02期
关键词
D O I
10.1103/PhysRevE.68.027102
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
We consider a model for surface deposition in one dimension, in the presence of both precursor-layer diffusion and desorption. The model is a generalization that includes random sequential adsorption (RSA), accelerated RSA, and growth-and-coalescence models as special cases. Exact solutions are obtained for the model for both its lattice and continuum versions. Expressions are obtained for physically important quantities such as the surface coverage, average island size, mass-adsorption efficiency, and the process efficiency. The connection between a limiting case of the model and epidemic models is discussed.
引用
收藏
页码:1 / 027102
页数:4
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