Interactions of carbon atoms and dimer vacancies on the Si(001) surface

被引:2
|
作者
Ciobanu, CV [1 ]
Barbu, A
Briggs, RM
机构
[1] Colorado Sch Mines, Div Engn, Golden, CO 80401 USA
[2] Univ Calif Los Angeles, Dept Comp Sci, Los Angeles, CA 90095 USA
关键词
D O I
10.1115/1.2019898
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
We investigate the interactions between substitutional carbon atoms on the defect free, (2 X 1) reconstructed Si(001) surface, and bring evidence that the interaction energy differs significantly from the inverse-cube distance dependence that is predicted by the theory of force dipoles on an elastic half-space. Based on Tersoff potentials, we also calculate the interactions between carbon atoms and dimer vacancies. The calculations indicate that dimer vacancies (DVs) are strongly stabilized by fourth-layer C atoms placed directly underneath them. By use of simple model Monte Carlo simulations, we show that the computed interactions between carbon atoms and DVs lead to self-assembled vacancy lines, in qualitative agreement with recent experimental results.
引用
收藏
页码:462 / 467
页数:6
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