Characterization of ZnO:Al films, deposited on organic substrate by r.f. magnetron sputtering

被引：0
|
作者：
Ma, J [1 ]
Hao, XT
Zhang, SY
Ma, HL
机构：
[1] Shandong Univ, Sch Phys & Microelect, Inst Optoelect Mat & Devices, Jinan 250100, Peoples R China
[2] Chang An Univ, Inst Sci, Xian 710064, Peoples R China
来源：
JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY | 2003年 / 19卷 / 04期
关键词：
zinc oxide; microstructure; electrical and optical properties;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Transparent conducting Al-doped zinc oxide (ZnO:Al) films with good adhesion have been deposited on polyimide thin film substrates by r.f. magnetron sputtering technique at low substrate temperature (25similar to180degreesC). The structural, optical and electrical properties of the deposited films were investigated.. High quality films with electrical resistivity as low as 8.5X10(-4) Omega.cm and the average transmittance over 74% in the wavelength range of the visible spectrum have been obtained. The electron carrier concentrations are in the range from 2.9x10(20) to 7.1x10(20) cm(-3) with mobilities from 4 to 8.8 cm(2) V(-1)s(-1). The densities of the films are in the range from 4.58 to 5.16 g/cm(-3).
引用
收藏
页码：363 / 365
页数：3
相关论文
共 50 条
  • [21] Effects of substrate temperature on electrical and optical properties ITO films deposited by r.f. magnetron sputtering
    Jae-Hyeong Lee
    Journal of Electroceramics, 2009, 23
  • [22] Effects of sputtering power on the properties of ZnO:Ga films deposited by r.f. magnetron-sputtering at low temperature
    Yu, XH
    Ma, J
    Ji, F
    Wang, YH
    Zhang, XJ
    Cheng, CF
    Ma, HL
    JOURNAL OF CRYSTAL GROWTH, 2005, 274 (3-4) : 474 - 479
  • [23] Effects of substrate temperature on electrical and optical properties ITO films deposited by r.f. magnetron sputtering
    Lee, Jae-Hyeong
    JOURNAL OF ELECTROCERAMICS, 2009, 23 (2-4) : 554 - 558
  • [24] Photoresponse of polycrystalline ZnO films deposited by r.f. bias sputtering
    Univ of Waterloo, Waterloo, Canada
    Thin Solid Films, 1-2 (334-339):
  • [25] Study on transparent conducting ZnO:Al films deposited on organic substrate by RF magnetron sputtering
    Yang, Tianlin
    Zhang, Deheng
    Li, Ziran
    Ma, Honglei
    Ma, Jin
    Taiyangneng Xuebao/Acta Energiae Solaris Sinica, 1999, 20 (02): : 200 - 203
  • [26] Electrical and infrared characterization of thin SiO2 films deposited by r.f. magnetron sputtering
    Nedev, N.
    Manolov, E.
    Nesheva, D.
    Terrazas, J. M.
    Valdez, B.
    Curiel, M. A.
    Zlatev, R.
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2009, 11 (09): : 1300 - 1303
  • [27] Structural, optical and electrical properties of V doped ZnO thin films deposited by r.f. magnetron sputtering
    Lovchinov, K.
    Nichev, H.
    Angelov, O.
    Sendova-Vassileva, M.
    Mikli, V.
    Dimova-Malinovska, D.
    16 ISCMP: PROGRESS IN SOLID STATE AND MOLECULAR ELECTRONICS, IONICS AND PHOTONICS, 2010, 253
  • [28] The structural and optical properties of zinc oxide thin films deposited on PET substrate by r.f. magnetron sputtering
    Lu, Yang-Ming
    Tsai, Shu-yi
    Lu, Jeng-Jong
    Hon, Min-Hsiung
    NANOSCIENCE AND TECHNOLOGY, PTS 1 AND 2, 2007, 121-123 : 971 - 974
  • [29] Piezoelectric ZnO films by r.f. sputtering
    Molarius, J
    Kaitila, J
    Pensala, T
    Ylilammi, M
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2003, 14 (5-7) : 431 - 435
  • [30] Piezoelectric ZnO films by r.f. sputtering
    J. Molarius
    J. Kaitila
    T. Pensala
    M. Ylilammi
    Journal of Materials Science: Materials in Electronics, 2003, 14 : 431 - 435
12345