Use of a high-frequency magnetron discharge for the utilization of chlorinated gases

被引：0
|
作者：
Vetoshkin, VM [1 ]
Danilov, AA [1 ]
Krylov, PN [1 ]
机构：
[1] Udmurt State Univ, Izhevsk 426034, Russia
来源：
INSTRUMENTS AND EXPERIMENTAL TECHNIQUES | 2003年 / 46卷 / 04期
关键词：
Copper; Aluminum; Physical Chemistry; Chlorinate; Solid State;
D O I：
10.1023/A:1025154720536
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The possibility of applying a high-frequency magnetron discharge for the utilization of a chlorinated gas used for the reactive-ion etching of copper and aluminum is discussed. It is shown that a high-frequency magnetron discharge can be used for binding reactive-gas components and transforming them from the gas to the solid state. The dependence of the utilization efficiency on the high-frequency power, the magnetic-field strength, and the target material is studied.
引用
收藏
页码：554 / 557
页数：4
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