Design of beamline optics for EUVL

被引：21
|
作者：
Watanabe, T
Haga, T
Niibe, M
Kinoshita, H
机构：
[1] Himeji Inst Technol, Himeji, Hyogo 67122, Japan
[2] NTT Corp, Syst Elect Labs, Atsugi, Kanagawa 24301, Japan
来源：
JOURNAL OF SYNCHROTRON RADIATION | 1998年 / 5卷
关键词：
extreme-ultraviolet lithography (EUVL); collimating optics; beamline design; toroidal mirrors;
D O I：
10.1107/S0909049597017536
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
The design of front-end collimating optics for extreme-ultraviolet lithography (EUVL) is reported. For EUVL, collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror can achieve shorter optical path lengths than collimating optics consisting of two concave toroidal mirrors. Collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror are discussed. The design of collimating optics for EUVL beamlines based on ray-tracing studies is described.
引用
收藏
页码：1149 / 1152
页数：4
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