Design of beamline optics for EUVL

被引：20
|
作者：
Watanabe, T
Haga, T
Niibe, M
Kinoshita, H
机构：
[1] Himeji Inst Technol, Himeji, Hyogo 67122, Japan
[2] NTT Corp, Syst Elect Labs, Atsugi, Kanagawa 24301, Japan
来源：
JOURNAL OF SYNCHROTRON RADIATION | 1998年 / 5卷
关键词：
extreme-ultraviolet lithography (EUVL); collimating optics; beamline design; toroidal mirrors;
D O I：
10.1107/S0909049597017536
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
The design of front-end collimating optics for extreme-ultraviolet lithography (EUVL) is reported. For EUVL, collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror can achieve shorter optical path lengths than collimating optics consisting of two concave toroidal mirrors. Collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror are discussed. The design of collimating optics for EUVL beamlines based on ray-tracing studies is described.
引用
收藏
页码：1149 / 1152
页数：4
相关论文
共 50 条
  • [1] Testing EUVL optics
    不详
    [J]. R&D MAGAZINE, 2005, 47 (08): : 10 - 10
  • [2] Damage study for the design of the European XFEL beamline optics
    Gaudin, J.
    Sinn, H.
    Samoylova, L.
    Yang, F.
    Tschentscher, T.
    [J]. DAMAGE TO VUV, EUV, AND X-RAY OPTICS II, 2009, 7361
  • [3] Design of beamline optics for large-field exposure
    Hasegawa, M
    Gomei, Y
    Hisatsugu, T
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (12B): : 6845 - 6850
  • [4] The SLS optics beamline
    Flechsig, U.
    Abela, R.
    Betemps, R.
    Blumer, H.
    Frank, K.
    Jaggi, A.
    MacDowell, A. A.
    Padmore, H. A.
    Schoenherr, V.
    Ulrich, I.
    Walther, H.
    Zelenika, S.
    Zumbach, C.
    [J]. SYNCHROTRON RADIATION INSTRUMENTATION, PTS 1 AND 2, 2007, 879 : 890 - +
  • [5] Development progress of optics for EUVL at Nikon
    Murakami, Katsuhiko
    Oshino, Tetsuya
    Kondo, Hiroyuki
    Shiraishi, Masayuki
    Chiba, Hiroshi
    Komatsuda, Hideki
    Nomura, Kazushi
    Nishikawa, Jin
    [J]. ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES, 2009, 7271
  • [6] EUVL Optics: Status and Future Perspectives
    Kaiser, Winfried
    [J]. 2019 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATION (VLSI-TSA), 2019,
  • [7] EUVL Optics: Status and Future Perspectives
    Kaiser, Winfried
    [J]. 2019 INTERNATIONAL SYMPOSIUM ON VLSI DESIGN, AUTOMATION AND TEST (VLSI-DAT), 2019,
  • [8] X-ray optics simulation and beamline design for the APS upgrade
    Shi, Xianbo
    Reininger, Ruben
    Harder, Ross
    Haeffner, Dean
    [J]. ADVANCES IN COMPUTATIONAL METHODS FOR X-RAY OPTICS IV, 2017, 10388
  • [9] Particle optics and accelerator modeling software for industrial and laboratory beamline design
    Gillespie, GH
    Hill, BW
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1998, 139 (1-4): : 476 - 480
  • [10] Characterization of striae in ULE® for EUVL optics and masks
    Rosch, William
    Beall, Lorrie
    Maxon, John
    Sabia, Robert
    Sell, Robert
    [J]. EMERGING LITHOGRAPHIC TECHNOLOGIES X, PTS 1 AND 2, 2006, 6151 : U1072 - U1079
12345