X-RAY SCATTERING FROM CRYSTALLINE SiO2 IN THE THERMAL OXIDE LAYERS ON VICINAL Si(111) SURFACES.

被引：0
|
作者：
Shimura, T. [1 ]
Misaki, H. [1 ]
Umeno, M. [1 ]
机构：
[1] Osaka Univ, Grad Sch, Dept Mat & Life Sci, Suita, Osaka 565, Japan
来源：
ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES | 1996年 / 52卷
关键词：
D O I：
10.1107/S0108767396080932
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
MS12.02.06
引用
收藏
页码：C465 / C465
页数：1
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