High-fluence nitrogen implantation into metals

被引:9
|
作者
Miyagawa, Y
Ikeyama, M
Saitoh, K
Nakao, S
Miyagawa, S
机构
[1] Natl. Indust. Res. Inst. of Nagoya, Nagoya 462, 1-1 Hirate-cho, Kita-ku
来源
SURFACE & COATINGS TECHNOLOGY | 1996年 / 83卷 / 1-3期
关键词
high-fluence nitrogen implantation; dynamic Monte Carlo simulation; implanted nitrogen depth profile; metal sputtering by nitrogen;
D O I
10.1016/0257-8972(95)02814-5
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Nitride ceramics are formed on metal surfaces by high-fluence nitrogen implantation and the mechanical and chemical properties of the surfaces are modified. However, the thickness of the nitride layer is limited by the sputtering effect and the migration of implanted nitrogen towards the surface. In this work, we studied these effects for nitrogen implantation into several kinds of metals (Al, Si, Ti, V, Fe, Co, Ni, Zr, Nb, Mo, Ta and W) by Monte Carlo simulations using the dynamic SASAMAL code in comparison with the experimental results obtained by NRA. The dynamic SASAML code takes into account target alterations which occur under high-fluence implantations, so that dynamic changes in composition, deposited energy, retained probability of the implanted ion, sputtering effects, etc. with fluence can be calculated. For nitrogen implantations into metals, the saturated nitrogen concentration is assumed to equal that of the saturated nitride phase and nitrogen atoms above stoichiometry are assumed to diffuse towards the surface. The depth profiles of nitrogen concentration and the retention of nitrogen obtained by the code agree very well. with the experimental results for 50 keV nitrogen implantations into metals with fluences of 10(17)-10(18) ions cm(-2). The calculated sputtering yields were compared with the semi-empirical values.
引用
下载
收藏
页码:275 / 279
页数:5
相关论文
共 50 条
  • [21] Multilayered phase formation after high-fluence implantation of nickel into aluminium
    Hessler-Wyser, A
    Cuenat, A
    Döbeli, M
    Abromeit, C
    Gotthardt, R
    PHILOSOPHICAL MAGAZINE LETTERS, 2001, 81 (12) : 893 - 899
  • [22] THE EFFECTS OF MODEL PARAMETER VARIATIONS ON HIGH-FLUENCE ION-IMPLANTATION
    CARTER, G
    NOBES, MJ
    KATARDJIEV, IV
    ABRIL, I
    GRASMARTI, A
    JIMENEZRODRIGUEZ, JJ
    PEINADOR, JA
    VACUUM, 1993, 44 (08) : 783 - 789
  • [23] Formation of buried oxide layers in molybdenum by high-fluence oxygen ion implantation
    Renner, B
    Hammerl, C
    Rauschenbach, B
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2000, 160 (03): : 363 - 371
  • [24] High-fluence ion implantation of In into Al crystals: formation and evolution of buried layers
    Touboltsev, VS
    Dybkjaer, G
    Johansen, A
    Johnson, E
    Sarholt, L
    Andersen, HH
    Olsen, M
    PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES, 1998, 77 (02): : 341 - 354
  • [25] Formation of buried oxide layers in titanium by high-fluence oxygen ion implantation
    Hammerl, C
    Bohne, Y
    Assmann, W
    Helming, K
    Rauschenbach, B
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2003, 206 : 1072 - 1076
  • [26] SPUTTERING OF TARGET CHAMBER MATERIALS DURING HIGH-FLUENCE ION-IMPLANTATION
    MASTERS, BJ
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1973, 18 (02): : 226 - 227
  • [27] PHASE-FORMATION IN IRON AFTER HIGH-FLUENCE ION-IMPLANTATION
    RAUSCHENBACH, B
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 80-1 : 303 - 308
  • [28] High fluence implantation of nitrogen into titanium: fluence dependence of sputtering yield, retained fluence and nitrogen depth profile
    Miyagawa, Y.
    Nakao, S.
    Ikeyama, M.
    Saitoh, K.
    Miyagawa, S.
    Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1997, 121 (1-4): : 340 - 344
  • [29] High fluence implantation of nitrogen into titanium: Fluence dependence of sputtering yield, retained fluence and nitrogen depth profile
    Miyagawa, Y
    Nakao, S
    Ikeyama, M
    Saitoh, K
    Miyagawa, S
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 121 (1-4): : 340 - 344
  • [30] High-fluence implantation of negative metal ions into polymers for surface modification and nanoparticle formation
    Boldyryeva, H
    Umeda, N
    Plaksin, OA
    Takeda, Y
    Kishimoto, N
    SURFACE & COATINGS TECHNOLOGY, 2005, 196 (1-3): : 373 - 377