Electrochemical behavior of titanium thin films obtained by magnetron sputtering

被引：0
|
作者：
Turcio-Ortega, David [1 ]
Rodil, Sandra Elizabeth [1 ]
Muhl, Stephen [1 ]
机构：
[1] Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico
来源：
MATERIALS SCIENCE-MEDZIAGOTYRA | 2008年 / 14卷 / 01期
关键词：
titanium thin films; magnetron sputtering; biomaterials; EIS;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A study of titanium thin films deposited on stainless steel 316L having different thickness was carried out using the Electrochemical Impedance Spectroscopy (EIS) and Polarization Curves (PC) experiments as the coated system were immersed in 0.89% NaCl solution. The interpretation of the EIS data is based upon a two-layer model of the film, consisting of a Ti thin film and a Ti-oxide outer layer. The circuit parameters were correlated with the dielectric characteristics and microstucture of the titanium thin films. Analysis of experimental results done by modelling the EIS data show that the corrosion process was getting difficult with time, while the PC gives information about the corrosion rate of the coated systems as a function of the thickness of the Ti deposit.
引用
收藏
页码：15 / 19
页数：5
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