Fundamental mechanisms of film growth

被引：0
|
作者：
Savage, DE [1 ]
Liu, F [1 ]
Zielasek, V [1 ]
Lagally, MG [1 ]
机构：
[1] Univ Wisconsin, Madison, WI 53706 USA
来源：
GERMANIUM SILICON: PHYSICS AND MATERIALS | 1999年 / 56卷
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：49 / 100
页数：52
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