Influence of WC-Co Substrate Pretreatment on Diamond Film Deposition by Laser-Assisted Combustion Synthesis

被引:22
|
作者
Veillere, Amelie [1 ,2 ]
Guillemet, Thomas [1 ,2 ]
Xie, Zhi Qiang [1 ]
Zuhlke, Craig A. [1 ]
Alexander, Dennis R. [1 ]
Silvain, Jean-Francois [2 ]
Heintz, Jean-Marc [2 ]
Chandra, Namas [3 ]
Lu, Yong Feng [1 ]
机构
[1] Univ Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
[2] Univ Bordeaux, CNRS, ICMCB, F-33608 Pessac, France
[3] Univ Nebraska, Dept Mech Engn, Lincoln, NE 68588 USA
关键词
diamond; substrate pretreatment; chemical and laser etchings; cobalt diffusion; residual stress; Raman spectroscopy; CHEMICAL-VAPOR-DEPOSITION; SURFACE; INTERFACES; COATINGS; STRESSES; GROWTH; CVD;
D O I
10.1021/am101271b
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The quality of diamond films deposited on cemented tungsten carbide substrates (WC-Co) is limited by the presence of the cobalt binder. The cobalt in the WC-Co substrates enhances the formation of nondiamond carbon on the substrate surface, resulting in a poor film adhesion and a low diamond quality. In this study, we investigated pretreatments of WC-Co substrates in three different approaches, namely, chemical etching, laser etching, and laser etching followed by acid treatment. The laser produces a periodic surface pattern, thus increasing the roughness and releasing the stress at the interfaces between the substrate and the grown diamond film. Effects of these pretreatments have been analyzed in terms of microstructure and cobalt content. Raman spectroscopy was conducted to characterize both the diamond quality and compressive residual stress in the films.
引用
收藏
页码:1134 / 1139
页数:6
相关论文
共 50 条
  • [31] EFFECT OF SUBSTRATE TEMPERATURE ON TANTALUM CARBIDES INTERLAYERS SYNTHESIZED ONTO WC-Co SUBSTRATES FOR ADHERENT DIAMOND DEPOSITION
    Yu, Shengwang
    Gao, Jie
    Li, Xiaojing
    Ma, Dandan
    Hei, Hongjun
    Shen, Yanyan
    Rong, Wolong
    Liu, Xiaoping
    He, Zhiyong
    Tang, Bin
    SURFACE REVIEW AND LETTERS, 2019, 26 (02)
  • [32] The influence of working distance on laser deposited WC-Co
    Xiong, Yuhong
    Smugeresky, John E.
    Schoenung, Julie M.
    JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 2009, 209 (10) : 4935 - 4941
  • [33] Influence of Laser Shock Processing on WC-Co Hardmetal
    Peng, Chong
    Meng, Yujie
    Guo, Wei
    MATERIALS AND MANUFACTURING PROCESSES, 2016, 31 (06) : 794 - 801
  • [34] Effect of microwave plasma-etching decarburization adhesive strength of CVD diamond film to WC-Co substrate
    Liu, X.S.
    Sun, F.H.
    Chen, M.
    Zhang, Z.M.
    Jingangshi yu Moliao Moju Gongcheng/Diamond & Abrasives Engineering, 2001, (05):
  • [35] A study of diamond film deposition on WC-Co inserts for graphite machining:: Effectiveness of SiC interlayers prepared by HFCVD
    Cabral, Gil
    Gaebler, Jan
    Lindner, Joern
    Gracio, Jose
    Polini, Riccardo
    DIAMOND AND RELATED MATERIALS, 2008, 17 (06) : 1008 - 1014
  • [36] Interface characteristics of CVD diamond coating on WC-Co cemented carbide substrate
    Wang, Xiaoling
    Ye, Jinwen
    SURFACE & COATINGS TECHNOLOGY, 2024, 485
  • [37] Experimental study on damage mechanism and surface quality optimization of WC-Co by in-situ laser-assisted turning
    Kong, Deshi
    Shi, Guangfeng
    Meng, Siwei
    Jiang, Ziwei
    Zou, Chunyang
    INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS, 2024, 124
  • [38] CVD diamond coating on WC-Co substrate with Al-based interlayer
    Ye, Fan
    Li, Yuanshi
    Sun, Xiaoyu
    Yang, Qiaoqin
    Kim, Chang-Yong
    Odeshi, Akindele G.
    SURFACE & COATINGS TECHNOLOGY, 2016, 308 : 121 - 127
  • [39] Layer adhesion and critical strain of HFCVD diamond coatings on WC-Co substrate
    Lechner, Stefan
    Baron, Sarah
    Hoefer, Markus
    Stein, Christian
    Mueller, Soeren
    MATERIAL FORMING, ESAFORM 2024, 2024, 41 : 670 - 677
  • [40] Fractal dimension and surface topography on the diamond deposition of seeded WC-Co substrates
    Chou, C. -C.
    Lin, H. -H.
    JOURNAL OF APPLIED PHYSICS, 2010, 107 (07)