Effect of plasma pre-treatment on dewetting properties of CVD Cu on CVD W2N barrier layer

被引：0
|
作者：
Cheng, DG [1 ]
Nuesca, G [1 ]
Eisenbraun, E [1 ]
机构：
[1] SUNY Albany, Sch NanoSci & NanoEngn, Albany, NY 12203 USA
来源：
MATERIALS, TECHNOLOGY AND RELIABILITY FOR ADVANCED INTERCONNECTS AND LOW-K DIELECTRICS-2003 | 2003年 / 766卷
关键词：
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The effect of different plasma Pre-treatments of chemical vapor deposited (CVD) tungsten nitride (W2N) surfaces on the dewetting behavior of subsequently grown CVD Cu films was investigated by annealing the resulting film stacks in high purity argon. It was found that a hydrogen plasma pre-treatment significantly improved the resistance to Cu dewetting from the W2N surfaces while ammonia and nitrogen plasma pretreatment slightly accelerated the dewetting process. The proposed mechanisms and ramifications of these findings were discussed.
引用
收藏
页码：471 / 475
页数：5
相关论文
共 50 条
  • [1] Effect of copper surface pre-treatment on the properties of CVD grown graphene
    Kim, Min-Sik
    Woo, Jeong-Min
    Geum, Dae-Myeong
    Rani, J. R.
    Jang, Jae-Hyung
    AIP ADVANCES, 2014, 4 (12):
  • [2] Effect of CVD Mn Oxide Layer as Cu Diffusion Barrier for TSV
    Murugesan, M.
    Bea, J. C.
    Lee, K. W.
    Fukushima, T.
    Tanaka, T.
    Koyanagi, M.
    Sutou, Y.
    Wang, H.
    Koike, J.
    2013 IEEE INTERNATIONAL 3D SYSTEMS INTEGRATION CONFERENCE (3DIC), 2013,
  • [3] Temperature dependence of tribological properties of W2N/Cu coatings
    Zhao, Hongjian
    Yu, Lihua
    Ye, Fuxing
    Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology, 2015, 35 (07): : 825 - 830
  • [4] Effect of Barrier Plasma Pre-Treatment on Polyester Films and their Adhesive Properties on Oak Wood
    Novak, Igor
    Sedliacik, Jan
    Gajtanska, Milada
    Schmidtova, Jarmila
    Popelka, Anton
    Bekhta, Pavlo
    Krystofiak, Tomasz
    Proszyk, Stanislaw
    Zigo, Ondrej
    BIORESOURCES, 2016, 11 (03): : 6335 - 6345
  • [5] Barrier Properties of CVD Mn Oxide Layer to Cu Diffusion for 3-D TSV
    Lee, Kang-Wook
    Wang, Hao
    Bea, Ji-Cheol
    Murugesan, Mariappan
    Sutou, Yuji
    Fukushima, Takafumi
    Tanaka, Tetsu
    Koike, Junichi
    Koyanagi, Mitsumasa
    IEEE ELECTRON DEVICE LETTERS, 2014, 35 (01) : 114 - 116
  • [6] Influence of thickness on the material characteristics of reactively sputtered W2N layer and electrical properties of W/W2N/SiO2/Si capacitors
    Jiang, Pei-Chuen
    Yen, Chih-Kun
    Chen, J. S.
    JOURNAL OF ALLOYS AND COMPOUNDS, 2008, 463 (1-2) : 522 - 527
  • [7] Effect of WC-Co substrates pre-treatment and microstructure on the adhesive toughness of CVD diamond
    Kamiya, S
    Takahashi, H
    Polini, R
    D'Antonio, P
    Traversa, E
    DIAMOND AND RELATED MATERIALS, 2001, 10 (3-7) : 786 - 789
  • [8] Pre-treatment effect on aluminum thin films deposition from CVD using dimethylethylamine alane
    Jang, TW
    Rhee, HS
    Ahn, BT
    ADVANCED INTERCONNECTS AND CONTACT MATERIALS AND PROCESSES FOR FUTURE INTEGRATED CIRCUITS, 1998, 514 : 351 - 356
  • [9] Effects of annealing on X-ray-amorphous CVD W-Si-N barrier layer materials
    Gokce, OH
    Amin, S
    Ravindra, NM
    Szostak, DJ
    Paff, RJ
    Fleming, JG
    Galewski, CJ
    Shallenberger, J
    Eby, R
    THIN SOLID FILMS, 1999, 353 (1-2) : 149 - 156
  • [10] 3D crystal growth model for understanding the role of plasma pre-treatment on CVD diamond crystal shape
    Silva, F.
    Achard, J.
    Bonnin, X.
    Michau, A.
    Tallaire, A.
    Brinza, O.
    Gicquel, A.
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2006, 203 (12): : 3049 - 3055
12345