Vapor deposition preparation of thin poly-p-xylylene films

被引：0

作者：

Knyazeva, AA ^{[1
]}

Ozerin, SA ^{[1
]}

Grigor'ev, EI ^{[1
]}

Chvalun, SN ^{[1
]}

Zav'yalov, SA ^{[1
]}

Kardash, IE ^{[1
]}

机构：

[1] Karpov Inst Phys Chem, Fed State Unitary Enterprise, Moscow 105064, Russia

来源：

POLYMER SCIENCE SERIES B | 2005年 / 47卷 / 7-8期

关键词：

D O I：

暂无

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

The structure and properties of poly-p-xylylene films prepared by vapor deposition in an inert gas flow at different substrate temperatures were studied by the techniques of wide-angle X-ray scattering; differential scanning calorimetry; thermogravimetric analysis; and UV, IR, and Raman spectroscopy. Differences in the structure and properties of the films prepared by vapor deposition in an inert-gas stream and in vacuum (the Gorham method) are due to the fact that the film deposition proceeds in the diffusion regime in the inert gas but in the kinetic regime in vacuum.

引用

页码：210 / 214

页数：5

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