Fabrication of ferroelectric microstructures by electron-beam-induced patterning process

被引：3

作者：

Fujii, Tadashi ^{[1
]}

Nakata, Kazuhisa ^{[1
]}

Adachi, Masatoshi ^{[1
]}

机构：

[1] Toyama Prefectural Univ Imizu, Intelligent Syst Design Engn, Toyama 9390398, Japan

来源：

FERROELECTRICS | 2007年 / 356卷

关键词：

ferroelectric thin film; electron-beam-induced reaction process; microstructures;

D O I：

10.1080/00150190701512847

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

0.5 to 500 mu m-sized square dots of (Pb,Sr)TiO3 micropatterns were fabricated by electron-beam-induced micropatterning process using scanning electron microscope (SEM)-based electron beam lithography system. Using SEM and atomic force microscope observation, obtained dots over 1 mu m square exhibits sharp edge, however 0.8 mu m square dots have a round edge. In 500 mu m square pattern, piezoelectric hysteresis curve was observed by piezoresponse scanning force microscopy.

引用

页码：545 / +

页数：7

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