One-step synthesis of chlorinated graphene by plasma enhanced chemical vapor deposition

被引：21
|
作者：
Fan, Liwei [1 ]
Zhang, Hui [1 ]
Zhang, Pingping [1 ]
Sun, Xuhui [1 ]
机构：
[1] Soochow Univ, Inst Funct Nano & Soft Mat FUNSOM, Jiangsu Key Lab Carbon Based Funct Mat & Devices, Suzhou 215123, Peoples R China
来源：
APPLIED SURFACE SCIENCE | 2015年 / 347卷
关键词：
Graphene; Chlorination; Plasma; p-type; CARBON NANOTUBES; FUNCTIONALIZATION; HALOGENATION; GROWTH; SINGLE; FILMS;
D O I：
10.1016/j.apsusc.2015.04.147
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
We developed an approach to synthesize the chlorinated single layer graphene (CI-G) by one-step plasma enhanced chemical vapor deposition. Copper foil was simply treated with hydrochloric acid and then CuCl2 formed on the surface was used as Cl source under the assistance of plasma treatment. Compared with other two-step methods by post plasma/photochemical treatment of CVD-grown single layer graphene (SLG), one-step CI-G synthesis approach is quite straightforward and effective. X-ray photoelectron spectroscopy (XPS) revealed that similar to 2.45 atom% Cl remained in SLG. Compared with the pristine SLG, the obvious blue shifts of G band and 2D band along with the appearance of D' band and D + G band in the Raman spectra indicate p-type doping of CI-G. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码：632 / 635
页数：4
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