Adsorption Dynamics of CO on Silica-Supported Cu Clusters: A Molecular Beam Scattering Study

被引：7
|
作者：
Komarneni, M. [1 ]
Shan, J. [1 ]
Burghaus, U. [1 ]
机构：
[1] N Dakota State Univ, Dept Chem & Biochem, Fargo, ND 58108 USA
来源：
JOURNAL OF PHYSICAL CHEMISTRY C | 2011年 / 115卷 / 33期
基金：
美国国家科学基金会;
关键词：
THERMAL-DESORPTION SPECTROSCOPY; ABSORPTION SPECTROSCOPY; MODEL CATALYSTS; COPPER; SURFACE; KINETICS; SIO2; OXIDATION; FILMS; GOLD;
D O I：
10.1021/jp205120e
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The adsorption kinetics and dynamics of CO on silica-supported Cu clusters were studied with thermal desorption spectroscopy and molecular beam scattering. In addition, the electronic properties of the Cu clusters and sample cleanliness were characterized with X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES). Physical vapor deposition was used to deposit the clusters; according to XPS, the Cu clusters remain metallic. The CO impact energy, surface temperature, and Cu coverage dependence of the adsorption dynamics can be discussed in the framework of the capture zone model. The XPS/AES and thermal desorption spectroscopy (TDS) data are consistent with a standard growth mode of Cu on silica: a nucleation phase is followed by a cluster growth phase until thick and rather smooth Cu films are formed.
引用
收藏
页码：16590 / 16597
页数：8
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