Irreversible kinetics in CVD: A reinterpretation of titanium nitride and tungsten formation

被引：0
|
作者：
van der Put, PJ [1 ]
Ammerlaan, JAM [1 ]
Dekker, JP [1 ]
Schoonman, J [1 ]
机构：
[1] Delft Univ Technol, Inorgan Chem Lab, NL-2628 BL Delft, Netherlands
来源：
CHEMICAL VAPOR DEPOSITION | 1999年 / 5卷 / 05期
关键词：
chemical model; mechanism for vapor deposition of solids; tungsten CVD; titanium nitride CVD;
D O I：
10.1002/(SICI)1521-3862(199910)5:5<211::AID-CVDE211>3.0.CO;2-P
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
A phenomenological model is proposed to describe the chemistry in CVD. The model takes account of the typical characteristics of CVD and is based on irreversible gas-surface reactions. To show its possibilities the model is used to derive rate coefficients from the observed kinetics of titanium nitride and tungsten deposition. It might become a simple and efficient tool to design deposition reactions for novel coatings.
引用
收藏
页码：211 / 218
页数：8
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