Characterization of GaN quantum discs embedded in AlxGa1-xN nanocolumns grown by molecular beam epitaxy -: art. no. 125305

被引:113
|
作者
Ristic, J [1 ]
Calleja, E
Sánchez-García, MA
Ulloa, JM
Sánchez-Páramo, J
Calleja, JM
Jahn, U
Trampert, A
Ploog, KH
机构
[1] Univ Politecn Madrid, ETSI Telecomun, ISOM, E-28040 Madrid, Spain
[2] Univ Politecn Madrid, ETSI Telecomun, Dept Ingn Elect, E-28040 Madrid, Spain
[3] Univ Autonoma Madrid, Dept Fis Mat, E-28049 Madrid, Spain
[4] Paul Drude Inst Festkorperelekt, D-10117 Berlin, Germany
来源
PHYSICAL REVIEW B | 2003年 / 68卷 / 12期
关键词
D O I
10.1103/PhysRevB.68.125305
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
GaN quantum discs embedded in AlGaN nanocolumns with outstanding crystal quality and very high luminescence efficiency were grown on Si(111) substrates by plasma-assisted molecular beam epitaxy under highly N-rich conditions. Nanocolumns with diameters in the range of 30-150 nm, with no traces of any extended defects, as confirmed by transmission electron microscopy, were obtained. GaN quantum discs, 2 and 4 nm thick, were grown embedded in AlGaN nanocolumns by switching on and off the Al flux during variable time spans. Strong optical emissions from GaN quantum discs, observed by photoluminescence and cathodoluminescence measurements, reveal quantum confinement effects. While Raman data indicate that the nanocolumns are fully relaxed, the quantum discs appear to be fully strained. These nanostructures have a high potential for application in efficient vertical cavity emitters.
引用
收藏
页数:5
相关论文
共 50 条
  • [1] AlxGa1-xN and GaN/AlxGa1-xN Quantum Wells Grown by Gas Source Molecular Beam Epitaxy
    Wang Xiaoliang
    [J]. Journal of Semiconductors, 1999, (05) : 3 - 5
  • [2] Carrier-confinement effects in nanocolumnar GaN/AlxGa1-xN quantum disks grown by molecular-beam epitaxy -: art. no. 085330
    Ristic, J
    Rivera, C
    Calleja, E
    Fernández-Garrido, S
    Povoloskyi, M
    Di Carlo, A
    [J]. PHYSICAL REVIEW B, 2005, 72 (08):
  • [3] Characterization of AlxGa1-xN layers grown by molecular beam epitaxy
    Kim, H
    Andersson, TG
    [J]. PHYSICA B-CONDENSED MATTER, 2001, 308 : 93 - 97
  • [4] Optical transitions in GaN/AlxGa1-xN multiple quantum wells grown by molecular beam epitaxy
    Smith, M
    Lin, JY
    Jiang, HX
    Salvador, A
    Botchkarev, A
    Kim, W
    Morkoc, H
    [J]. APPLIED PHYSICS LETTERS, 1996, 69 (17) : 2453 - 2455
  • [5] GaN quantum dots grown on AlxGa1-xN layer by plasma-assisted molecular beam epitaxy
    Hori, Y.
    Oda, O.
    Bellet-Amalric, E.
    Daudin, B.
    [J]. JOURNAL OF APPLIED PHYSICS, 2007, 102 (02)
  • [6] GaN/AlxGa1-xN quantum wells grown by molecular beam epitaxy with thickness control at the monolayer scale
    Grandjean, N
    Massies, J
    [J]. APPLIED PHYSICS LETTERS, 1998, 73 (09) : 1260 - 1262
  • [7] About some optical properties of AlxGa1-xN/GaN quantum wells grown by molecular beam epitaxy
    Leroux, M
    Semond, F
    Natali, F
    Byrne, D
    Cadoret, F
    Damilano, B
    Dussaigne, A
    Grandjean, N
    Le Louarn, A
    Vézian, S
    Massies, J
    [J]. SUPERLATTICES AND MICROSTRUCTURES, 2004, 36 (4-6) : 659 - 674
  • [8] Inhomogeneous broadening of AlxGa1-xN/GaN quantum wells -: art. no. 075311
    Natali, F
    Byrne, D
    Leroux, M
    Damilano, B
    Semond, F
    Le Louarn, A
    Vezian, S
    Grandjean, N
    Massies, J
    [J]. PHYSICAL REVIEW B, 2005, 71 (07):
  • [9] Deep level defects in AlxGa1-xN/GaN heterointerfaces grown by molecular beam epitaxy
    Jeon, Hee Chang
    Park, Chan Jin
    Cho, Hoon Young
    Kang, Tae Won
    Kim, Tae Whan
    Oh, Jae Eung
    [J]. ADVANCES IN NANOMATERIALS AND PROCESSING, PTS 1 AND 2, 2007, 124-126 : 89 - +
  • [10] Si-doped AlxGa1-xN(0.56≤ x ≤1) layers grown by molecular beam epitaxy with ammonia -: art. no. 132106
    Borisov, B
    Kuryatkov, V
    Kudryavtsev, Y
    Asomoza, R
    Nikishin, S
    Song, DY
    Holtz, M
    Temkin, H
    [J]. APPLIED PHYSICS LETTERS, 2005, 87 (13) : 1 - 3