Laser wavelength dependence of extreme ultraviolet light and particle emissions from laser-produced lithium plasmas

被引：13
|
作者：
Nagano, Akihisa [1 ]
Mochizuki, Takayasu [1 ]
Miyamoto, Shuji [1 ]
Amano, Sho [1 ]
机构：
[1] Univ Hyogo, Lab Adv Sci & Technol Ind, Ako Gun, Hyogo 6781205, Japan
来源：
APPLIED PHYSICS LETTERS | 2008年 / 93卷 / 09期
关键词：
D O I：
10.1063/1.2975180
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Maximum extreme ultraviolet (EUV) conversion efficiencies (CEs) of 2.3% and 1.8% were achieved in planar Li targets by using pulsed 2 omega and 1 omega Nd:YAG laser irradiation, respectively. In a forced recombination scheme, the total CE can be expected to be about 4%. The maximum kinetic energy of the lithium ion debris was found to be less than 1 keV, indicating that mirror damage caused by lithium ion debris is more easily mitigated by using a magnetic field than for tin ions. These results suggest that a Li target is a reasonable candidate for an EUV lithography source. (c) 2008 American Institute of Physics.
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页数：3
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