Diffusion of hydroxyl groups in silica glass through the binding interface

被引:5
|
作者
Sato, Naoya [1 ]
Yamamoto, Takaki [1 ]
Kuzuu, Nobu [1 ]
Horikoshi, Hideharu [2 ]
Niwa, Shohei [1 ]
机构
[1] Univ Fukui, Fukui 9100085, Japan
[2] Tosoh SGM Corp, Shunan, Yamaguchi 7460006, Japan
关键词
OH CONTENT DEPENDENCE; STRUCTURAL RELAXATION; INDUCED ABSORPTION; WATER DIFFUSION; FUSED QUARTZ; TEMPERATURE; SURFACE; BANDS;
D O I
10.7567/JJAP.55.02BC13
中图分类号
O59 [应用物理学];
学科分类号
摘要
Diffusion of hydroxyl groups in silica glass through an interface formed by binding between high-hydroxyl (ca. 1200 wt. ppm) and low-hydroxyl (ca. 130 wt. ppm)-containing silica glasses in the temperature range of 900-1150 degrees C was investigated. Although the theoretical curve with a hydroxyl-concentration-independent diffusion coefficient deviates from the experimental curve, the diffusion coefficients obtained by fitting to the experimental results by the least squares method coincided with the "effective diffusion coefficients" in the literature, which were obtained from the total absorption change in the IR absorption peak for the hydroxyl group using thin samples. By the analysis considering the hydroxyl concentration dependence of the diffusion coefficient, we showed that the diffusion coefficient is proportional to hydroxyl concentration at each temperature, which is consistent with the model of the diffusion: SiOSi + H2O = 2SiOH. On the basis of this scheme, we tried to evaluate the diffusion coefficients of molecular water using equilibrium constant in the literature. (C) 2016 The Japan Society of Applied Physics
引用
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页数:8
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