Three-Dimensional Structuring of Resists and Resins by Direct Laser Writing and Holographic Recording

被引:28
|
作者
Juodkazis, Saulius [1 ]
Mizeikis, Vygantas
Misawa, Hiroaki
机构
[1] Hokkaido Univ, CREST JST, Sapporo, Hokkaido 0010021, Japan
来源
PHOTORESPONSIVE POLYMERS I | 2008年 / 213卷 / 01期
关键词
Laser lithography; Optical nonlinearities; Optical structuring; Photopolymerization; Quantum lithography;
D O I
10.1007/12_2007_122
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Optical techniques for three-dimensional micro- and nanostructuring of transparent and photo-sensitive materials are reviewed with emphasis on methods of manipulation of the optical field, such as beam focusing, the use of ultrashort pulses, and plasmonic and near-field effects. The linear and nonlinear optical response of materials to classical optical fields as well as exploitation of the advantages of quantum lithography are discussed.
引用
收藏
页码:157 / 206
页数:50
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