Mechanism of synergetic material removal by electrochemomechanical magnetorheological polishing

被引:15
|
作者
Jang, Kyung-In [1 ]
Nam, Eunseok [1 ]
Lee, Chan-Young [1 ]
Seok, Jongvvon [2 ]
Min, Byung-Kwon [1 ]
机构
[1] Yonsei Univ, Sch Mech Engn, Seoul 120749, South Korea
[2] Chung Ang Univ, Sch Mech Engn, Seoul 156756, South Korea
基金
新加坡国家研究基金会;
关键词
Electrochemomechanical polishing; Tribocorrosion; Glassy carbon; GLASSY-CARBON ELECTRODES; FOCUSED ION-BEAM; DEACTIVATION MECHANISM; LASER;
D O I
10.1016/j.ijmachtools.2013.03.011
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The mechanism of material removal by electrochemomechanical magnetorheological polishing of glassy carbon (GC) products is studied in this paper. Potentiostatic experiment was performed to examine the electrochemical oxidation mechanism and the associated oxide film growth on GC. A nanoindentation test revealed that the oxide film had lower hardness than did the original GC. An electrochemical impedance spectroscopy experiments were carried out to model the electrochemomechanical material removal mechanism. A series of tribocorrosion tests were conducted to quantitatively study the tribocorrosion synergism. (C) 2013 Elsevier Ltd. All rights reserved.
引用
收藏
页码:88 / 92
页数:5
相关论文
共 50 条
  • [31] Optimization of polishing path and material removal for uniform material removal in optical surface polishing
    Qu, Xingtian
    Liu, Qinglong
    Wang, Hongyi
    Liu, Haizhong
    Liu, Jiming
    Sun, Huichao
    INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY, 2023, 124 (5-6): : 1699 - 1722
  • [32] Insight into Polishing Slurry and Material Removal Mechanism of Photoassisted Chemical Mechanical Polishing of YAG Crystals
    Zhang, Xiaoyu
    Guo, Xingchen
    Wang, Haoxiang
    Kang, Renke
    Gao, Shang
    LANGMUIR, 2023, 39 (38) : 13668 - 13677
  • [33] Machining performance and material removal mechanism of sapphire with novel polishing slurry
    Xu, Yongchao
    Peng, Cheng
    Zhan, Youji
    Wang, Qianting
    APPLIED SURFACE SCIENCE, 2024, 671
  • [34] Detection of subsurface damage and material removal mechanism in optical polishing process
    Wang, Zhuo
    Wu, Yu-Lie
    Dai, Yi-Fan
    Li, Sheng-Yi
    Lu, De-Feng
    Xu, Hui-Yun
    Guofang Keji Daxue Xuebao/Journal of National University of Defense Technology, 2009, 31 (02): : 107 - 111
  • [35] Origin of material removal mechanism in shear thickening-chemical polishing
    Li, Min
    Liu, Minghui
    Riemer, Oltmann
    Karpuschewski, Bernhard
    Tang, Cheng
    INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE, 2021, 170
  • [36] Material removal mechanism of ceria particles with different sizes in glass polishing
    Peng, Wenqiang
    Guan, Chaoliang
    Li, Shengyi
    OPTICAL ENGINEERING, 2014, 53 (03)
  • [37] Research on the molecular scale material removal mechanism in chemical mechanical polishing
    WANG YongGuang & ZHAO YongWu School of Mechanical Engineering
    Chinese Science Bulletin, 2008, (13) : 2084 - 2089
  • [38] Research on the molecular scale material removal mechanism in chemical mechanical polishing
    Wang YongGuang
    Zhao YongWu
    CHINESE SCIENCE BULLETIN, 2008, 53 (13): : 2084 - 2089
  • [39] Magnetorheological fluid polishing using an electromagnet with straight pole-piece for improving material removal rate
    Kim, Byung Chan
    Chung, Jae Hwa
    Cho, Myeong Woo
    Ha, Seok Jae
    Yoon, Gil-Sang
    JOURNAL OF MECHANICAL SCIENCE AND TECHNOLOGY, 2018, 32 (07) : 3345 - 3350
  • [40] Magnetorheological fluid polishing using an electromagnet with straight pole-piece for improving material removal rate
    Byung Chan Kim
    Jae Hwa Chung
    Myeong Woo Cho
    Seok Jae Ha
    Gil-Sang Yoon
    Journal of Mechanical Science and Technology, 2018, 32 : 3345 - 3350