Sol-gel processing and UVA patterning of epoxy-based hybrid organic-inorganic thin films

被引：9

作者：

Briche, S. ^{[1
]}

Riassetto, D. ^{[1
]}

Gastaldin, C. ^{[1
]}

Lamarle, C. ^{[2
]}

Dellea, O. ^{[2
]}

Jamon, D. ^{[3
]}

Pernot, E. ^{[1
]}

Labeau, M. ^{[1
]}

Ravel, G. ^{[4
]}

Langlet, M. ^{[1
]}

机构：

[1] Grenoble INP, LMGP, F-38016 Grenoble 1, France

[2] PF D2M CEA LITEN, F-42000 St Etienne, France

[3] Univ St Etienne, DIOM, F-42023 St Etienne, France

[4] CEA LITEN, F-38054 Grenoble 9, France

来源：

JOURNAL OF MATERIALS SCIENCE | 2008年 / 43卷 / 17期

关键词：

D O I：

10.1007/s10853-008-2884-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Sol-gel processed photosensitive hybrid organic-inorganic films, deposited from 2-(3,4-epoxycyclohexylethyltrimethoxysilane) (EETMOS), have been studied. EETMOS sols have been optimized with respect to several criteria that guarantee a good quality, photosensitivity, and reproducibility of derived films. Photo-sensitivity of EETMOS-based films has been assessed by UVA exposure experiments. Optimized films have been photo-patterned using a mercury lamp or a He-Cd laser source, both emitting in the UVA spectral range. Promising micronic size motives have been laser patterned. The quality of derived motives is discussed with respect to photopolymerization mechanisms and photo-patterning parameters.

引用

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页码：5809 / 5822

页数：14

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