Deposition of iron sulfide thin films by AACVD from single source precursors

被引:34
|
作者
Akhtar, Masood
Abdelhady, Ahmed Lutfi
Malik, M. Azad
O'Brien, Paul [1 ]
机构
[1] Univ Manchester, Sch Chem, Manchester M13 9PL, Lancs, England
基金
英国工程与自然科学研究理事会;
关键词
Crystallites; Substrates; Aerosol assisted chemical vapor deposition (AACVD); Cubic pyrite; Hexagonal pyrrhotite; tris(dialkyldithiocarbamato)iron(III); FES2; PYRITE; NANOPARTICLES; GROWTH; PYRRHOTITE; CHEMISTRY; COMPLEX;
D O I
10.1016/j.jcrysgro.2012.02.013
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The unsymmetrical [Fe((S2CNEtPr)-Pr-i)(3)] (1), [Fe(S2CNEtMe)(3)] (2) and symmetrical [Fe(S2CN(Hex)(2))(3)] (3), Fe(S2CN(Et)(2))(3)] (4) tris(dialkyldithiocarbamato)iron(III) complexes were used as single source precursors for the deposition of iron sulfide thin films by the aerosol assisted chemical vapor Deposition (AACVD) method. The unsymmetrical complexes deposited the mixed phases (pyrite and marcasite) at all deposition temperatures except the complex (2) which deposited pyrite and pyrrhotite at 400 degrees C. The symmetrical complex (3) with longer alkyl groups produced a mixture of pyrite and pyrrhotite phases at 350 and 450 degrees C but pyrite and mackinawite at 400 degrees C whereas the complex (4) with shorter alkyl groups deposited a mixture of pyrite and marcasite at 350 degrees C but a pure pyrrhotite phase at 400 and 450 degrees C. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码:106 / 112
页数:7
相关论文
共 50 条
  • [1] Iron sulfide (FeS2) thin films from single-source precursors by aerosol-assisted chemical vapor deposition (AACVD)
    O'Brien, P
    Otway, DJ
    Park, JH
    CHEMICAL PROCESSING OF DIELECTRICS, INSULATORS AND ELECTRONIC CERAMICS, 2000, 606 : 133 - 138
  • [2] AACVD of Molybdenum Sulfide and Oxide Thin Films From Molybdenum(V)-based Single-source Precursors
    Savjani, Nicky
    Brent, Jack R.
    O'Brien, Paul
    CHEMICAL VAPOR DEPOSITION, 2015, 21 (1-3) : 71 - 77
  • [3] Heterocyclic dithiocarbamato-iron(III) complexes: single-source precursors for aerosol-assisted chemical vapour deposition (AACVD) of iron sulfide thin films
    Mlowe, Sixberth
    Lewis, David J.
    Malik, Mohammad Azad
    Raftery, James
    Mubofu, Egid B.
    O'Brien, Paul
    Revaprasadu, Neerish
    DALTON TRANSACTIONS, 2016, 45 (06) : 2647 - 2655
  • [4] Iron Thiobiurets: Single-Source Precursors for Iron Sulfide Thin Films
    Ramasamy, Karthik
    Malik, Mohammad A.
    Helliwell, Madeline
    Tuna, Floriana
    O'Brien, Paul
    INORGANIC CHEMISTRY, 2010, 49 (18) : 8495 - 8503
  • [5] Deposition of iron sulfide nanocrystals from single source precursors
    Akhtar, Masood
    Akhter, Javeed
    Malik, M. Azad
    O'Brien, Paul
    Tuna, Floriana
    Raftery, James
    Helliwell, Madeleine
    JOURNAL OF MATERIALS CHEMISTRY, 2011, 21 (26) : 9737 - 9745
  • [6] Organotin Dithiocarbamates: Single-Source Precursors for Tin Sulfide Thin Films by Aerosol-Assisted Chemical Vapor Deposition (AACVD)
    Ramasamy, Karthik
    Kuznetsov, Vladimir L.
    Gopal, Kandasamy
    Malik, Mohammad A.
    Raftery, James
    Edwards, Peter P.
    O'Brien, Paul
    CHEMISTRY OF MATERIALS, 2013, 25 (03) : 266 - 276
  • [7] Deposition of antimony sulfide thin films from single-source antimony thiolate precursors
    Rodriguez-Castro, Jorge
    Dale, Phillip
    Mahon, Mary F.
    Molloy, Kieran C.
    Peter, Laurie M.
    CHEMISTRY OF MATERIALS, 2007, 19 (13) : 3219 - 3226
  • [8] Selective Deposition of Cobalt Sulfide Nanostructured Thin Films from Single-Source Precursors
    Ramasamy, Karthik
    Malik, Mohammad A.
    Raftery, James
    Tuna, Floriana
    O'Brien, Paul
    CHEMISTRY OF MATERIALS, 2010, 22 (17) : 4919 - 4930
  • [9] Deposition of rod-shaped antimony sulfide thin films from single-source antimony thiosemicarbazone precursors
    Biswal, Jasmine B.
    Sawant, Narayan V.
    Garje, Shivram S.
    THIN SOLID FILMS, 2010, 518 (12) : 3164 - 3168
  • [10] Organotin Dithiocarbamates: Single-Source Precursors for Tin Sulfide Thin Films by Aerosol-Assisted Chemical Vapor Deposition (AACVD) (vol 25, pg 266, 2013)
    Ramasamy, Karthik
    Kuznetsov, Vladimir L.
    Gopal, Kandasamy
    Malik, Mohammad A.
    Raftery, James
    Edwards, Peter P.
    O'Brien, Paul
    CHEMISTRY OF MATERIALS, 2014, 26 (10) : 3348 - 3348