Density-functional calculation of van der Waals forces for free-electron-like surfaces

被引:50
|
作者
Hult, E [1 ]
Hyldgaard, P
Rossmeisl, J
Lundqvist, BI
机构
[1] Chalmers, Dept Appl Phys, S-41296 Gothenburg, Sweden
[2] Gothenburg Univ, S-41296 Gothenburg, Sweden
[3] Tech Univ Denmark, Dept Phys, Ctr Atom Scale Mat Phys, DK-2800 Lyngby, Denmark
来源
PHYSICAL REVIEW B | 2001年 / 64卷 / 19期
关键词
D O I
10.1103/PhysRevB.64.195414
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A recently proposed general density functional for asymptotic van der Waals forces is used to calculate van der Waals coefficients and reference-plane positions for realistic low-indexed Al surfaces. Results are given for a number of atoms and molecules outside the surfaces, as well as for the interaction between the surfaces themselves. The densities and static image-plane positions that are needed as input in the van der Waals functional are calculated self-consistently within density-functional theory using the generalized-gradient approximation, pseudopotentials, and plane waves. This study shows that the van der Waals density functional is applicable to realistic surfaces. The need for physically correct surface models, especially for open surfaces, is also illustrated. Finally the parameters for the anisotropic interaction of O-2 with Al are calculated.
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页数:7
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