Atomic layer deposition (ALD) and molecular layer deposition (MLD) techniques with atomic level control enable a new class of hybrid organic inorganic materials with improved functionality. In this work, the cross-plane thermal conductivity and volumetric heat capacity of three types of hybrid organic inorganic zincone thin films enabled by MLD processes and alternate AID MILD processes were measured using the frequency-dependent time-domain thermoreflectance method. We revealed the critical role of backbone flexibility in the structural morphology and thermal conductivity of MLD zincone thin films by comparing the thermal conductivity of MILD zincone films with an aliphatic backbone to that with aromatic backbone. Much lower thermal conductivity values were obtained in ALD/MLD-enabled hybrid organic inorganic zincone thin films compared to that of the ALD-enabled W/Al2O3 nanolaminates reported by Costescu et al. [Science 2004, 303, 989-990], which suggests that the dramatic material difference between organic and inorganic materials may provide a route for producing materials with ultralow thermal conductivity.
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Univ Nice Sophia Antipolis, Lab Chim Mat Organ & Met, Equipe Chim Organ Interfaces, F-06108 Nice 2, FranceUniv Nice Sophia Antipolis, Lab Chim Mat Organ & Met, Equipe Chim Organ Interfaces, F-06108 Nice 2, France
de Givenchy, Elisabeth Taffin
Dufay, Mickael
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Univ Nice Sophia Antipolis, Lab Chim Mat Organ & Met, Equipe Chim Organ Interfaces, F-06108 Nice 2, FranceUniv Nice Sophia Antipolis, Lab Chim Mat Organ & Met, Equipe Chim Organ Interfaces, F-06108 Nice 2, France
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Wuhan Univ Technol, Sch Mat Sci & Engn, Wuhan 430070, Peoples R ChinaWuhan Univ Technol, Sch Mat Sci & Engn, Wuhan 430070, Peoples R China
Li, Linfeng
Huang, Yaoqi
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Wuhan Univ Technol, Sch Mat Sci & Engn, Wuhan 430070, Peoples R China
Harvard Univ, Sch Engn & Appl Sci, Cambridge, MA 02138 USAWuhan Univ Technol, Sch Mat Sci & Engn, Wuhan 430070, Peoples R China
Huang, Yaoqi
Li, Yuanyuan
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Wuhan Univ Technol, Sch Mat Sci & Engn, Wuhan 430070, Peoples R ChinaWuhan Univ Technol, Sch Mat Sci & Engn, Wuhan 430070, Peoples R China
Li, Yuanyuan
Cheng, Xiaomin
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Wuhan Univ Technol, Sch Mat Sci & Engn, Wuhan 430070, Peoples R China
Huanggang Normal Univ, Sch Electromech & Intelligent Mfg, Huanggang 438000, Peoples R ChinaWuhan Univ Technol, Sch Mat Sci & Engn, Wuhan 430070, Peoples R China
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Hanyang Univ, Div Mat Sci & Engn, 222 Wangsimni Ro, Seoul 04763, South KoreaHanyang Univ, Div Mat Sci & Engn, 222 Wangsimni Ro, Seoul 04763, South Korea
Lee, Seung-Hwan
Jeong, Hyun-Jun
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Hanyang Univ, Div Mat Sci & Engn, 222 Wangsimni Ro, Seoul 04763, South KoreaHanyang Univ, Div Mat Sci & Engn, 222 Wangsimni Ro, Seoul 04763, South Korea
Jeong, Hyun-Jun
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Han, Ki-Lim
Baek, GeonHo
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Hanyang Univ, Div Nanoscale Semicond Engn, 222 Wangsimni Ro, Seoul 04763, South KoreaHanyang Univ, Div Mat Sci & Engn, 222 Wangsimni Ro, Seoul 04763, South Korea
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Univ Colorado, Dept Chem, Boulder, CO 80309 USA
Univ Colorado, Dept Chem Engn, Boulder, CO 80309 USAUniv Colorado, Dept Chem, Boulder, CO 80309 USA
Lee, Byoung H.
Yoon, Byunghoon
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Univ Colorado, Dept Chem, Boulder, CO 80309 USA
Univ Colorado, Dept Chem Engn, Boulder, CO 80309 USAUniv Colorado, Dept Chem, Boulder, CO 80309 USA
Yoon, Byunghoon
Abdulagatov, Aziz I.
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Univ Colorado, Dept Chem, Boulder, CO 80309 USA
Univ Colorado, Dept Chem Engn, Boulder, CO 80309 USAUniv Colorado, Dept Chem, Boulder, CO 80309 USA
Abdulagatov, Aziz I.
Hall, Robert A.
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Univ Colorado, Dept Chem, Boulder, CO 80309 USA
Univ Colorado, Dept Chem Engn, Boulder, CO 80309 USAUniv Colorado, Dept Chem, Boulder, CO 80309 USA
Hall, Robert A.
George, Steven M.
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Univ Colorado, Dept Chem, Boulder, CO 80309 USA
Univ Colorado, Dept Chem Engn, Boulder, CO 80309 USAUniv Colorado, Dept Chem, Boulder, CO 80309 USA