Growth of copper and high dielectric thin films via atomic layer deposition

被引：0
|
作者：
Cheng, Hansong [1 ,2 ]
Han, Bo [2 ]
Huang, Liang [2 ]
机构：
[1] Natl Univ Singapore, Dept Chem, Singapore 117548, Singapore
[2] China Univ Geosci, Dept Chem, Wuhan 430074, Hubei, Peoples R China
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2013年 / 246卷
关键词：
D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
134-COMP
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页数：1
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