ORGANIC THERMAL MODE PHOTORESISTS FOR APPLICATIONS IN NANO-LITHOGRAPHY

被引：0
|
作者：
Wu, Hsiu-Wen [1 ]
Li, Ming Chia [2 ]
Yang, Chin-Tien [3 ]
Cheng, Chung-Ta [2 ]
Chen, Shuen-Chen
Huang, Der-Ray [1 ]
机构：
[1] Natl Dong Hwa Univ, Dept Optoelect, Hualien 970, Taiwan
[2] ITRI, Electron & Optoelectron Res Lab, Hsinchu, Taiwan
[3] ITRI, Nanotechnol Res Ctr, Hsinchu, Taiwan
来源：
TMS 2012 141ST ANNUAL MEETING & EXHIBITION - SUPPLEMENTAL PROCEEDINGS, VOL 1: MATERIALS PROCESSING AND INTERFACES | 2012年
关键词：
Thermal photoresists; Submicron pattern; nano-lithography;
D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
A new technology called thermal mode lithography for developing new thermal mode photoresists with temperature sensitive characteristics has been investigated. In this study, we synthesized four types of polymethine compounds that can be applied to thermal mode photoresists. The photo UV absorption and thermal properties are the important characteristics of thermal mode photoresists. The decomposition and gasification mechanisms of thermal photoresists can be analyzed by thermal properties. The surface morphology of nano-patterns can be controlled by using different laser power exposure on thermal photoresists. A cost effective way to achieve submicron or nano-structure patterns is possible.
引用
收藏
页码：663 / 668
页数：6
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